PVD / PACVD Processes

There are two main process categories for thin coating deposition. Physical Vapor Deposition (PVD) is very versatile and has a number of available enhancements. Plasma Assisted Chemical Vapor Deposition (PACVD) utilizes plasma to enhance chemical reaction rates for deposition.

Products & Services

PVD Processes

Improve the performance of your tools and components with coatings applied using our Physical Vapor Deposition (PVD) processes. We offer both arc and sputter deposition processes, or an innovative hybrid process combining the advantages of both technologies.

PACVD Processes

Coating applications that require a low temperature can be achieved using Plasma Assisted Chemical Vapor Deposition (PACVD) through pulsed-glow or high-frequency discharges. It operates at significantly lower temperatures than thermal Chemical Vapor Deposition (CVD).

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Resources

Brochures

Plasma-Assisted Surface Coating [
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Product Information

Efficient Solutions for Thin Film Equipment [
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